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| World Class Vacuum Performance in the Harshest Etch and CVD Environments |
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LOT Vacuum’s design provides the shortest vacuum path for any pump in its class. This advantage moves particulate through the pump quickly while contacting very few parts. This feature provides less opportunity for particulate to bind the pumping mechanism, which results in trouble free operation over longer periods of time. This design advantage has been proven for years in the most demanding 150mm to 300mm Silicon Nitride CVD applications and aggressive chemistries and is now bringing market leadership to MEMS Etching.
Click Here for a Power Point review of the unique advantages of
LOT’s vacuum pump design
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LOT Vacuum America Product Brochure |
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LD120/HD120 Series:
High Efficiency, Comapct Solutions for Point of Use Applications
Products PDF
LD 120, LD 1000, HD 120, HD 600, HD 1200 |
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DD255 Series:
Exceptional pumping speed for Solar PV, 300mm, and Flat Panel Display Applications
Products PDF
DD255, DD1055, DD1855, DD2055, DD3055, DD3555 |
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D105 Series:
Short Gas Path Ideal for Agressive Pumping Applications
Products PDF
DD105, DD605, DD1205, DD2005 |
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