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PROCESS GAS APPLICATIONS
 

DD Series Dry Pumps
Overview

    DD105       (62 cfm )
DD605      (324 cfm)
DD1205    (588 cfm)
DD2005  (1206 cfm)
DD255      (150 cfm)
DD1055    (500 cfm)
DD1855    (942 cfm)
DD2055  (1030 cfm)
DD3055  (1736 cfm)
DD3555  (2148 cfm)
 
 
HD / LD Series Dry Pumps
Overview
   

HD120        (70 cfm)
HD600      (250 cfm)
HD1200    (650 cfm)
LD120        (70 cfm)
LD1000    (530 cfm)

 
 
AI Series Dry (Oil Free) Vacuum PUmps
Overview
   

ISP-90        (3.8 cfm)
ISP-250C   (10.6 cfm)
ISP-500C    (21.2 cfm)
ISP-1000    (42.4 cfm)
DVSL 100B (4.2 cfm)
DVSL 501B(18.4 cfm)

 

Semiconductor, Scientific, NanoTech, and R&D Applications

 

 

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  Contact
 

Phone
970-240-9429

Fax
970-240-8996

Email
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Address
P.O. Box 177
Montrose, CO 81402

 

LOT Vacuum Pumps: World Class Dominant in

300mm Aggressive Applications

LOT Pumps are found on the most aggressive FPD, 300mm, 200mm and 150mm applications.

  • The DD series is unique; the split-dual-helical dry vacuum pump design is ideally suited for the most aggressive and high flow environments.
  • The HD hybrid dual helical pump addresses lower flow requirements in harsh applications while providing world class energy management and communication features.
  •  The LD Series supports all inert and light duty applications while also providing world class energy management and communication features.

Regardless of the process or the platform, LOT Vacuum has a world class pumps that will meet your needs.

DD Series Pumps:

Excellent Performance in Aggressive, High Demand, High Flow, Applications

DD Series Pumps are application proven on all Semiconductor processes. The DD255 series is well suited for all FPD, 300mm, and 200mm applications by supporting high particulate loads, aggressive chemistries, and high process gas flows.  All DD series pumps can be combined with VFD Driven Mechanical Boosters for higher pumping speeds, lower vacuum pressures, and energy management benefits.

The DD105 Series, based on the same fundamental design as the DD255 Series, provides the same excellent performance for 200mm and 150mm applications.

  • Recommended Applications: Crystal Pulling, Lamination, PECVD anti-reflective coating deposition, CdTe and CIGS processes
  • Pumping Capacities: 105 M3/hr  to 3,555 M3/hr (70-2,148 cfm)

 

HD Series Pumps:

World Class CoO for Harsh Applications

HD Series Pumps are application proven pumps providing world class energy efficiency, low CoO, and excellent reliability. HD series are a good selection for PECVD and LPCD applications involving corrosive, condensable and particulate by-products.  They are very compact, quiet and have state of the art network, control and feedback capabilities. 

  • Recommended Applications: Diffusion Furnaces, PECVD, a-Si / u-Si deposition, Etch, LPCVD,
  • Pumping Capacities: 120 M3/hr  to 1,000 M3/hr (70-588 cfm)

LD Series Pumps:

World Class Energy Efficiency for Light Duty Applications

LD Series pumps are designed to sip electricity and back turbo pumps. LD pumps are an excellent choice for entry and exit load locks, PVD Turbos, evaporation chambers, and transfer chambers.  LD Pumps incorporate the same start of the art energy and communication features as the HD series.

  • Recommended Applications: Turbo Pump Backing for PVD and Evap Chambers
  • Pumping Capacities: 120 M3/hr  to 900 M3/hr (70-530 cfm)